Thick Film Technology
Thick-film high precision pattern formation to align with Thin-film patterns
Noritake Thick-film Technology has been used in the VFD production process for a long time and enables high precision pattern formation aligned with Thin-film patterns.
We can also apply Photo-lithography technology to make even better accuracy patterning to the phosphors, insulators, etc.
We can supply high-quality Thick-film forming in the work area up to 500 x 350mm.
Please consult us with higher requirements.
Example of Noritake Thick-film technology on the VFD glass substrate
|Photo-lithography||Dot Pitch||325μm min.|
|Dot Size||◻200μm min.*|
|Tick Film Printing||Line Pitch||500μm min.|
|Line Width||200μm min.|
|VIA hole||60×150μm min(Hex shape)|
|Printing Material||Conductive materials – Silver.etc
Black insulator, Transparent insulator
Glass paste, etc.
|Substrate Material||Glass, Ceramics, etc.|
|Applicable Work Size (area)||500 x 350mm (Max.)|
|Application in VFD||Display pattern, Insulation layer formation, etc.|
◻ symbol means both side members are the same length